JPH0426103B2 - - Google Patents

Info

Publication number
JPH0426103B2
JPH0426103B2 JP2054284A JP2054284A JPH0426103B2 JP H0426103 B2 JPH0426103 B2 JP H0426103B2 JP 2054284 A JP2054284 A JP 2054284A JP 2054284 A JP2054284 A JP 2054284A JP H0426103 B2 JPH0426103 B2 JP H0426103B2
Authority
JP
Japan
Prior art keywords
group
photopolymerization initiator
examples
present
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2054284A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60164739A (ja
Inventor
Koichi Kawamura
Akira Umehara
Atsuaki Arai
Eisaku Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP2054284A priority Critical patent/JPS60164739A/ja
Publication of JPS60164739A publication Critical patent/JPS60164739A/ja
Publication of JPH0426103B2 publication Critical patent/JPH0426103B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP2054284A 1984-02-07 1984-02-07 光重合性組成物 Granted JPS60164739A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2054284A JPS60164739A (ja) 1984-02-07 1984-02-07 光重合性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2054284A JPS60164739A (ja) 1984-02-07 1984-02-07 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS60164739A JPS60164739A (ja) 1985-08-27
JPH0426103B2 true JPH0426103B2 (en]) 1992-05-06

Family

ID=12030038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2054284A Granted JPS60164739A (ja) 1984-02-07 1984-02-07 光重合性組成物

Country Status (1)

Country Link
JP (1) JPS60164739A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1988007042A1 (en) * 1987-03-17 1988-09-22 Hitachi Chemical Company, Ltd. Substituted acridine derivatives and their use
US4985564A (en) * 1988-09-03 1991-01-15 Hitachi Chemical Co., Ltd. Acridine compound and photopolymerizable composition using the same
JP2505637B2 (ja) * 1990-09-28 1996-06-12 日立化成工業株式会社 光重合性組成物および光重合性エレメント

Also Published As

Publication number Publication date
JPS60164739A (ja) 1985-08-27

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